All Categories
Metal Sputtering Targets

Yttrium Sputtering Targets (Y)


MaterialYttrium
FormsPlanar,
Purity99.9%
SizeCircular:Diameter≤14 inches, Thickness≥1mm;Plate:L≤32 inches, W:≤12 inches, Thickness≥1mm
ProcessMelting
AnalysisGDMS, ICP-OES, XRF
PackagingVacuum (standard export packing)
ApplicationsElectronic devices, medical imaging, semiconductor, laboratory research


Overview

Yttrium Sputtering Targets (Y) Information

The chemical symbol of yttrium is Y, with a melting point of 1522°C and a boiling point of 3338°C. It is ductile, can react with hot water, and is easily soluble in dilute acid. Special glass and alloys can be made.

Material TypeTellurium
SymbolTe
Atomic Weight127.6
Atomic Number52
Color/AppearanceSilvery Lustrous Gray, Semi-Metallic
Thermal Conductivity3 W/m.K
Melting Point (°C)449
Theoretical Density (g/cc)6.25
Z Ratio0.9
SputterRF
Type of BondIndium, Elastomer
UN Number3284
CommentsWets without alloying. Not recommended for sputtering.

Our yttrium target up to 99.9%, and smelting technology is adopted. Low gas content and uniform particle size distribution.

Yttrium targets have a special place in thin film deposition and microelectronics manufacturing because yttrium has high purity, good stability and specific physical and chemical properties. The application fields are quite broad. Due to its high temperature stability, yttrium is used in the manufacture of high temperature ceramics and as an additive to other materials. Additionally, it is used in manufacturing electronic devices, medical imaging, as a catalyst, and more.

We sell these different shapeyttrium metal materials by unit weight or piece for different use in research area and for new proprietary technologies.Actual prices can vary and may be higher or lower, as determined by availability and market fluctuations. To speak to someone directly about current pricing, please click inquiry.

Y-3N-COA

Y-3N-COA

Inquiry