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Metal Sputtering Targets

Vanadium Sputtering Targets (V)

SizeCircular:Diameter≤14 inches, Thickness≥1mm;Plate:L≤40 inches, W:≤12 inches, Thickness≥1mm
PackagingVacuum (standard export packing)
ApplicationsSolar energy,Flat panel displays,Electronics, Semiconductor

Vanadium Sputtering Targets (V) Information

Vanadium, the symbol V, silver-white metal, vanadium has a high melting point, often along with niobium, tantalum, tungsten, molybdenum as the refractory metal.It is ductile, hard, non-magnetic, resistant to hydrochloric acid and sulfuric acid, and has better properties than most stainless steels in conductivity, thermal conductivity, gas resistance, salt resistance and water corrosion resistance.Not oxidized in air, soluble in hydrofluoric acid, nitric acid and royal water.

Material TypeVanadium
Symbol V
Atomic Weight 50.9415
Atomic Number 23
Color/Appearance Silvery Gray Metallic
Thermal Conductivity 30.7 W/m.K
Melting Point (°C) 1,890
Coefficient of Thermal Expansion 8.4 x 10-6/K
Theoretical Density (g/cc) 6.11
Z Ratio 0.53
Sputter DC
Max Power Density 50*
(Watts/Square Inch)
Type of Bond Indium, Elastomer
Comments Wets Mo. E-beam-evaporated films preferred.

Our vanadium target is up to 99.95% and is annealed by melting process.Low gas content and uniform particle size distribution.

Vanadium alloy targets are often used in semiconductors, photovoltaic solar energy, integrated circuits, building glass, flat display, touch panels, etc.

The following pictures are two typical micrometallographic examination pictures of vanadium sputtering targets, with average particle size <100um.


We sell these different shape vanadium metal materials by unit weight or piece for different use in research area and for new proprietary technologies.Actual prices can vary and may be higher or lower, as determined by availability and market fluctuations. To speak to someone directly about current pricing, please click inquiry.