Rhenium Sputtering Targets (Re)
Material | Rhenium |
---|---|
Forms | Planar,Rotary |
Purity | 99.95%-99.99% |
Size | Circular:Diameter≤14 inches, Thickness≥1mm;Plate:L≤60 inches, W:≤12 inches, Thickness≥1mm |
Process | Melting |
Analysis | GDMS, ICP-OES, XRF |
Packaging | Vacuum (standard export packing) |
Applications | Semiconductor integrated circuits, solar photovoltaics, recording media, flat displays and workpiece surface coatings |
Overview
Rhenium Sputtering Targets (Re) Information
rhenium, element symbol: re, atomic number 75, it is a metal of VIIB group. The density of rhenium is 21.04g/cm ³, The melting point and boiling point are 3186 ° C (5767 ° F, 3459k) and 5596 ° C (10105 ° F, 5869k), respectively. Rhenium is a silver white rare high melting point metal. Its melting point ranks third among all elements (the first two are tungsten and carbon), its boiling point ranks first, and its density ranks fourth (the first three are platinum, iridium and osmium). Rhenium metal is hard, wear-resistant and corrosion-resistant. Rhenium is stable in air and vaporizes with sulfur at high temperature to synthesize rhenium disulfide, which forms halides with fluorine, chlorine and bromine. Rhenium is insoluble in hydrochloric acid, but soluble in nitric acid and hot concentrated sulfuric acid. Rhenium does not interact with hydrogen and nitrogen, but can absorb hydrogen
Material Type | Rhenium |
Symbol | Re |
Atomic Weight | 186.207 |
Atomic Number | 75 |
Color/Appearance | Grayish White, Metallic |
Thermal Conductivity | 48 W/m.K |
Melting Point (°C) | 3,180 |
Coefficient of Thermal Expansion | 6.2 x 10-6/K |
Theoretical Density (g/cc) | 21.02 |
Z Ratio | 0.15 |
Sputter | DC |
Max Power Density | 100* |
(Watts/Square Inch) | |
Type of Bond | Indium, Elastomer |
OurRheniumtarget up to 99.99%, and smelting technology is adopted. Low gas content and uniform particle size distribution
Rhenium targets are used for magnetron sputtering coating. Magnetron sputtering coating is a new physical vapor phase (PVD) coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. As an already A relatively mature technology, magnetron sputtering has been used in many fields, such as semiconductor integrated circuits, solar photovoltaics, recording media, flat displays, and workpiece surface coatings.
We sell these different shape vanadium metal materials by unit weight or piece for different use in research area and for new proprietary technologies.Actual prices can vary and may be higher or lower, as determined by availability and market fluctuations. To speak to someone directly about current pricing, please click inquiry.
Re-3N5-COA