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Metal Sputtering Targets

Lanthanium Sputtering Targets (La)

SizeCircular:Diameter≤14 inches, Thickness≥1mm;Plate:L≤32 inches, W:≤12 inches, Thickness≥1mm
PackagingVacuum (standard export packing)
ApplicationsElectronic devices, medical imaging, semiconductor, laboratory research


Lanthanium Sputtering Targets (La) Information

Lanthanum is a metallic rare earth element with a chemical symbol of La and an atomic number of 57 and an atomic weight of 138.90547. Silvery-gray, soft, 6.162 gcm3,920 â ° C melting point, 3464 â ° C boiling point (atmospheric pressure) , chemical property and lively. Exposed to air, it soon loses its metallic luster and forms a blue oxide film, but it does not protect the metal and further oxidizes it to form a white oxide powder. Can and cold water slow action, soluble in acid, can be a variety of non-metallic reaction. The metal lanthanum is generally kept in mineral oil or in rare gases.

Material TypeLanthanum
Symbol La
Atomic Weight 138.90547
Atomic Number 57
Color/Appearance Silvery White, Metallic
Thermal Conductivity 13 W/m.K
Melting Point (°C) 921
Coefficient of Thermal Expansion 12.1 x 10-6/K
Theoretical Density (g/cc) 6.17
Z Ratio 0.92
Sputter RF
Max Power Density 20*
(Watts/Square Inch)
UN Number 2813
Comments Films will burn in air if scraped.

Our lanthanumtarget up to 99.9%, and smelting technology is adopted. Low gas content and uniform particle size distribution.

Lanthanum (La) sputtering targets are used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

We sell these different shapelanthanummetal materials by unit weight or piece for different use in research area and for new proprietary technologies.Actual prices can vary and may be higher or lower, as determined by availability and market fluctuations. To speak to someone directly about current pricing, please click inquiry.