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Metal Sputtering Targets

Carbon Sputtering Targets (C)

MaterialCarbon / Graphite
SizeAs Request
ProcessHot Press Sintering
PackagingVacuum(standard export packing)
ApplicationsPhotovoltaic, semiconductor, chemical industry, machinery industry.

Carbon Sputtering Targets (C) Information:

Carbon, chemical symbol C, is stable at room temperature and does not react easily.Melting point 3500 ℃;Boiling point 4827 ℃;water soluble insoluble in water

Density 1.8 g/cm³;Appearance black powdery or granular porous crystal.Carbon also has many allotropes, such as diamond, graphite, graphene, fullerene, etc. These allotropes are widely used in aviation, medical, petrochemical, national defense and other fields. Additionally, carbon is a component of pig iron, wrought iron, and steel. Carbon can combine with itself chemically to form a large number of compounds, which are biologically and commercially important molecules. Most molecules in living organisms contain carbon.

Material TypeCarbon
Atomic Weight12.0107
Atomic Number6
Color/AppearanceBlack, Non-Metallic
Thermal Conductivity140 W/m.K
Melting Point (掳C)~3,652
Coefficient of Thermal Expansion7.1 x 10-6/K
Theoretical Density (g/cc)2.25
Z Ratio3.26
Max Power Density80*
Type of BondIndium, Elastomer
CommentsE-beam preferred. Arc evaporation. Poor film adhesion.

Our carbon target is up to 99.999% and is annealed by hot-press sintering process. Low gas content and uniform particle size distribution.

Carbon alloy targets are often used in chemical industry, machinery industry, semiconductors, photovoltaic solar energy, integrated circuits, building glass, flat display, touch panels, etc.

We sell these different shape carbon metal materials by unit weight or piece for different use in research area and for new proprietary technologies.Actual prices can vary and may be higher or lower, as determined by availability and market fluctuations. To speak to someone directly about current pricing, please click inquiry.