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Titanium Nitride (TiN) Sputtering Targets
High purity 2N5 (99.5%) titanium nitride ceramic target. The price is for reference only, please contact customer service for quotation.
| Element: | TiN |
|---|---|
| Purity: | 2N5--4N |
| Shape: | Planar target |
| MOQ: | 1PC |
| Package: | Three-layer vacuum packaging or argon gas protection, in line with IATA, DOT packaging specification |
Overview
Physical and chemical properties
Titanium nitride ceramic target is an extremely hard coating material with a melting point of 2950°C and a density of 4.43g/cm³. It is a small structure material with high melting point, high hardness, good chemical stability and metal wettability, and has high electrical conductivity and superconductivity. Commonly used as a surface coating on titanium alloys, steel, carbide and aluminum parts to improve the surface properties of the substrate.
Application
For hardening and protecting cutting and sliding surfaces, for decorative purposes (due to its golden appearance), and as a non-toxic exterior for medical implants. The most common uses of TiN coatings are for edge retention and corrosion resistance in machine tools such as drills and milling cutters, often increasing their service life by a factor of three or more. It is also used to coat costume jewelry and automotive trim for decorative purposes. TiN is also widely used as a top coat, often with nickel (Ni) or chromium (Cr) plated substrates for consumer plumbing fixtures and door hardware. TiN is non-toxic and has been used in medical devices such as scalpel blades and orthopedic saw blades where sharpness and edge retention are important, medical implants, and aerospace and military applications.
Related Ceramic Sputtering Materials
| Oxide Sputtering Targets | ||||
|---|---|---|---|---|
| Aluminum Oxide(Al2O3) | Iron Tetroxide(Fe3O4) | Lanthanum Nickelate(LaNiO3) | Scandium Oxide(Sc2O3) | Aluminum Zinc Oxide(AZO) |
| Fluorine Tin Oxide(FTO) | Lanthanum Ferrite(LaFeO3) | Strontium Titanate(SrTiO3) | Antimony Tin Oxide(ATO) | Gallium Oxide(Ga2O3) |
| Lanthanum Manganate(LaMnO3) | Strontium Ruthenate(SrRuO3) | Bismuth Oxide(Bi2O3) | Gallium Zinc Oxide(GZO) | Magnesium Oxide(MgO) |
| Strontium Manganate(SrMnO3) | Bismuth Titanate(BiTiO3) | Gadolinium Oxide(Gd2O3) | Molybdenum Oxide(MoO3) | Titanium Dioxide(TiO2) |
| Barium Titanate(BaTiO3) | Hafnium Dioxide(HfO2) | Niobium Oxide(Nb2Ox) | Titanium Pentoxide(Ti3O5) | Cerium Oxide(CeO2) |
| Holmium Oxide(Ho2O3) | Nickel Oxide(NiO) | Tantalum Oxide(Ta2O5) | Chromium Oxide(Cr2O3) | Indium Oxide(In2O3) |
| Neodymium Oxide(Nd2O3) | Terbium Oxide(Tb4O7) | Cobalt Oxide(CoO) | Indium Tin Oxide(ITO) | Lead Oxide(PbO) |
| Thulium Oxide(Tm2O3) | Copper Oxide(CuO) | Indium Zinc Oxide(IZO) | Zinc Tin Oxide(ZTO) | Vanadium Dioxide(VO2) |
| Cuprous Oxide(Cu2O) | Indium Gallium Zinc Oxide(IGZO) | Praseodymium Oxide(Pr6O11) | Vanadium Trioxide(V2O3) | Erbium Oxide(Er2O3) |
| Lanthanum Oxide(La2O3) | Silicon Monoxide(SiO) | Vanadium Pentoxide(V2O5) | Europium Oxide(Eu2O3) | Lanthanum Strontium Cobalt Oxide(LSCO) |
| Silicon Dioxide(SiO2) | Tungsten Trioxide(WO3) | Iron Trioxide(Fe2O3) | Lanthanum Aluminate(LaAl2O3) | Samarium Oxide(Sm2O3) |
| Yttrium Oxide(Y2O3) | Yttrium Zirconium Oxide(YSZ) | Yttrium Barium Copper Oxide(YBCO) | Zinc Oxide(ZnO) | Zirconium Oxide(ZrO2) |
| Fluoride Sputtering Targets | ||||
| Aluminum Fluoride(AlF3) | Dysprosium Fluoride(DyF3) | Neodymium Fluoride(NdF3) | Praseodymium Fluoride(PrF3) | Yttrium Fluoride(YF3) |
| Barium Fluoride(BaF2) | Lithium Fluoride(LiF) | Sodium Fluoride(NaF) | Strontium Fluoride(SrF3) | Zinc Fluoride(ZnF3) |
| Calcium Fluoride(CaF2) | Lanthanum Fluoride(LaF3) | Sodium Aluminum Fluoride(Na2AlF6) | Samarium Fluoride(SmF3) | Ytterbium Fluoride(YbF3) |
| Cerium Fluoride(CeF3) | Magnesium Fluoride(MgF2) | Potassium Fluoride(KF) | ||
| Nitride Sputtering Targets | ||||
| Aluminum Nitride(AlN) | Hafnium Nitride(HfN) | Silicon Nitride(Si3N4) | Titanium Nitride(TiN) | Zirconium Nitride(ZrN) |
| Boron Nitride(BN) | Niobium Nitride(NbN) | Tantalum Nitride(TaN) | Vanadium Nitride(VN) | |
| Carbide Sputtering Targets | ||||
| Boron Carbide(B4C) | Niobium Carbide(NbC) | Tantalum Carbide(TaC) | Tungsten Carbide(WC) | Zirconium Carbide(ZrC) |
| Hafnium Carbide(HfC) | Nickel Carbide(NiC) | Titanium Carbide(TiC) | Tungsten Carbide Cobalt(WC+Co) | Vanadium Carbide(VC) |
| Molybdenum Carbide(MoC) | Silicon Carbide(SiC) | Titanium Carbonitride(TiCN) | ||
| Boride Sputtering Targets | ||||
| Chromium Diboride(CrB2) | Iron Boride(FeB) | Tantalum Boride(TaB) | Titanium Diboride(TiB2) | Hafnium Diboride(HfB2) |
| Lanthanum Hexaboride(LaB6) | Zirconium Diboride(ZrB2) | |||
| Sulfide Sputtering Targets | ||||
| Cadmium Sulfide(CdS) | Iron Sulfide(FeS) | Manganese Sulfide(MnS) | Tantalum Sulfide(TaS) | Magnesium Sulfide(MgS) |
| Copper Sulfide(CuS) | Lead Sulfide(PbS) | Niobium Sulfide(NbS) | Tungsten Sulfide(WS2) | Antimony Sulfide(Sb2S3) |
| Cerium Sulfide(Ce2S3) | Molybdenum Sulfide(MoS2) | Indium Sulfide(In2S3) | Zinc Sulfide(ZnS) | |
| Silicide Sputtering Targets | ||||
| Chromium Silicide(CrSi) | Magnesium Silicide(MgSi) | Tantalum Silicide(TaSi2) | Tungsten Silicide(WSi2) | Zirconium Silicide(ZrSi2) |
| Molybdenum Silicide(MoSi2) | Nickel Silicide(NiSi) | Titanium Silicide(TiSi2) | Vanadium Silicide(VSi) | |
| Selenide Sputtering Targets | ||||
| Bismuth Selenide(Bi2Se3) | Chromium Selenide(CrSe) | Molybdenum Selenide(MoSe2) | Gallium Selenide(Ga2Se3) | Tungsten Selenide(WSe2) |
| Copper Selenide(Cu2Se) | Lead Selenide(PbSe) | Indium Selenide(In2Se3) | Germanium Selenide(GeSe2) | Tin Selenide(SnSe) |
| Cadmium Selenide(CdSe) | Antimony Selenide(Sb2Se3) | |||
| Telluride Sputtering Targets | ||||
| Cadmium Telluride(CdTe) | Lead Telluride(PbTe) | Germanium Telluride(GeTe) | Germanium Antimony Telluride(GST) | Bismuth Telluride(Bi2Te3) |
| Antimony Tritelluride(Sb2Te3) | Antimony Tritelluride(Sb7Te3) | |||
| Antimonide Sputtering Targets | ||||
| Aluminum Antimonide(AlSb) | Indium Antimonide(InSb) | Gallium Antimonide(GaSb) | Zinc Antimonide(ZnSb) | Aluminum Gallium Antimonide(AlGaSb) |
| Compound Sputtering Targets For Ferroelectric/Lithium Batteries | ||||
| Lithium Cobalt Oxide LiCoO2 | Lithium Manganese Nickel Oxide LiNi0.5Mn1.5O3 | Lithium Iron Phosphate LiFePO4 | Lithium-Rich Lithium Cobalt OxideLi(1+X)CoO2 | Lithium-Rich Lithium ManganateLi(1+X)Mn2O4 |
| Lithium TitanateLi4Ti5O12 | Aluminum Doped Lithium Cobalt Oxide AlLiCoO2 | Aluminum Doped Lithium Manganate LiMn2O4+Alx | Lithium Titanium PhosphateLiTi2(PO4)3 | Lithium Manganate LiMn2O4 |
| Lithium Phosphate Li3PO4 | Lithium Silicon Phosphate LiSiPO4 | Barium TitanateBaTiO3 | Strontium TitanateSrTiO3 | Bismuth TitanateBiTiO3 |
| Lanthanum Strontium Cobalt Oxide LSCO | Lanthanum Calcium Manganese Oxide LCMO | Lithium Cobalt Oxide LiCo2O4 | Lead Zirconate TitanatePZT | Boron Oxide Doped Lithium Phosphate Li3PO4:B2O3 |
| Lithium Lanthanum Titanate Li0.35La0.57TiO3 | Lanthanum Zirconium Lithium Oxide LLZO | Lanthanum Strontium Manganese OxideLSMO | Bismuth FerriteBiFeO3 | Barium Strontium Titanate BaSrTiO3 |
