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Ceramic Sputtering Targets

Magnesium Fluoride(MgF2)Sputtering Targets


High purity 4N (99.99%) magnesium fluoride ceramic target.The price is for reference only, please contact customer service for quotation.

Element:MgF₂
Purity:4N
Shape:Planar target
MOQ:1PC
Package:Three-layer vacuum packaging or argon gas protection, in line with IATA, DOT packaging specification

Overview

Physical and chemical properties

Magnesium fluoride sputtering target is an inorganic compound, the molecular formula is MgF2, its melting point is 1261℃, and its density is 2.9-3.2g/cm³. Magnesium fluoride is a white crystalline salt that is transparent over a wide range of wavelengths and has commercial uses in optics and in space telescopes.

Specification

Shape: disc, disc, stepped disc, triangle, plate, sheet or according to drawings

Diameter: 355.6

mm (14 inches) max. Single piece size: Length: < 500mm, Width: < 250mm, Thickness: = ">1mm, if larger than this size, we can do 45 degree or 90 degree tile joints

Processing technology: hot pressing smelting

Application

Surface treatment methods for efficient collection of light by solar cells include surface texturing and antireflection film formation.

Related Ceramic Sputtering Materials

Oxide Sputtering Targets
Aluminum Oxide(Al2O3)Iron Tetroxide(Fe3O4)Lanthanum Nickelate(LaNiO3)Scandium Oxide(Sc2O3)Aluminum Zinc Oxide(AZO)
Fluorine Tin Oxide(FTO)Lanthanum Ferrite(LaFeO3)Strontium Titanate(SrTiO3)Antimony Tin Oxide(ATO)Gallium Oxide(Ga2O3)
Lanthanum Manganate(LaMnO3)Strontium Ruthenate(SrRuO3)Bismuth Oxide(Bi2O3)Gallium Zinc Oxide(GZO)Magnesium Oxide(MgO)
Strontium Manganate(SrMnO3)Bismuth Titanate(BiTiO3)Gadolinium Oxide(Gd2O3)Molybdenum Oxide(MoO3)Titanium Dioxide(TiO2)
Barium Titanate(BaTiO3)Hafnium Dioxide(HfO2)Niobium Oxide(Nb2Ox)Titanium Pentoxide(Ti3O5)Cerium Oxide(CeO2)
Holmium Oxide(Ho2O3)Nickel Oxide(NiO)Tantalum Oxide(Ta2O5)Chromium Oxide(Cr2O3)Indium Oxide(In2O3)
Neodymium Oxide(Nd2O3)Terbium Oxide(Tb4O7)Cobalt Oxide(CoO)Indium Tin Oxide(ITO)Lead Oxide(PbO)
Thulium Oxide(Tm2O3)Copper Oxide(CuO)Indium Zinc Oxide(IZO)Zinc Tin Oxide(ZTO)Vanadium Dioxide(VO2)
Cuprous Oxide(Cu2O)Indium Gallium Zinc Oxide(IGZO)Praseodymium Oxide(Pr6O11)Vanadium Trioxide(V2O3)Erbium Oxide(Er2O3)
Lanthanum Oxide(La2O3)Silicon Monoxide(SiO)Vanadium Pentoxide(V2O5)Europium Oxide(Eu2O3)Lanthanum Strontium Cobalt Oxide(LSCO)
Silicon Dioxide(SiO2)Tungsten Trioxide(WO3)Iron Trioxide(Fe2O3)Lanthanum Aluminate(LaAl2O3)Samarium Oxide(Sm2O3)
Yttrium Oxide(Y2O3)Yttrium Zirconium Oxide(YSZ)Yttrium Barium Copper Oxide(YBCO)Zinc Oxide(ZnO)Zirconium Oxide(ZrO2)
Fluoride Sputtering Targets
Aluminum Fluoride(AlF3)Dysprosium Fluoride(DyF3)Neodymium Fluoride(NdF3)Praseodymium Fluoride(PrF3)Yttrium Fluoride(YF3)
Barium Fluoride(BaF2)Lithium Fluoride(LiF)Sodium Fluoride(NaF)Strontium Fluoride(SrF3)Zinc Fluoride(ZnF3)
Calcium Fluoride(CaF2)Lanthanum Fluoride(LaF3)Sodium Aluminum Fluoride(Na2AlF6)Samarium Fluoride(SmF3)Ytterbium Fluoride(YbF3)
Cerium Fluoride(CeF3)Magnesium Fluoride(MgF2)Potassium Fluoride(KF)
Nitride Sputtering Targets
Aluminum Nitride(AlN)Hafnium Nitride(HfN)Silicon Nitride(Si3N4)Titanium Nitride(TiN)Zirconium Nitride(ZrN)
Boron Nitride(BN)Niobium Nitride(NbN)Tantalum Nitride(TaN)Vanadium Nitride(VN)
Carbide Sputtering Targets
Boron Carbide(B4C)Niobium Carbide(NbC)Tantalum Carbide(TaC)Tungsten Carbide(WC)Zirconium Carbide(ZrC)
Hafnium Carbide(HfC)Nickel Carbide(NiC)Titanium Carbide(TiC)Tungsten Carbide Cobalt(WC+Co)Vanadium Carbide(VC)
Molybdenum Carbide(MoC)Silicon Carbide(SiC)Titanium Carbonitride(TiCN)
Boride Sputtering Targets
Chromium Diboride(CrB2)Iron Boride(FeB)Tantalum Boride(TaB)Titanium Diboride(TiB2)Hafnium Diboride(HfB2)
Lanthanum Hexaboride(LaB6)Zirconium Diboride(ZrB2)
Sulfide Sputtering Targets
Cadmium Sulfide(CdS)Iron Sulfide(FeS)Manganese Sulfide(MnS)Tantalum Sulfide(TaS)Magnesium Sulfide(MgS)
Copper Sulfide(CuS)Lead Sulfide(PbS)Niobium Sulfide(NbS)Tungsten Sulfide(WS2)Antimony Sulfide(Sb2S3)
Cerium Sulfide(Ce2S3)Molybdenum Sulfide(MoS2)Indium Sulfide(In2S3)Zinc Sulfide(ZnS)
Silicide Sputtering Targets
Chromium Silicide(CrSi)Magnesium Silicide(MgSi)Tantalum Silicide(TaSi2)Tungsten Silicide(WSi2)Zirconium Silicide(ZrSi2)
Molybdenum Silicide(MoSi2)Nickel Silicide(NiSi)Titanium Silicide(TiSi2)Vanadium Silicide(VSi)
Selenide Sputtering Targets
Bismuth Selenide(Bi2Se3)Chromium Selenide(CrSe)Molybdenum Selenide(MoSe2)Gallium Selenide(Ga2Se3)Tungsten Selenide(WSe2)
Copper Selenide(Cu2Se)Lead Selenide(PbSe)Indium Selenide(In2Se3)Germanium Selenide(GeSe2)Tin Selenide(SnSe)
Cadmium Selenide(CdSe)Antimony Selenide(Sb2Se3)
Telluride Sputtering Targets
Cadmium Telluride(CdTe)Lead Telluride(PbTe)Germanium Telluride(GeTe)Germanium Antimony Telluride(GST)Bismuth Telluride(Bi2Te3)
Antimony Tritelluride(Sb2Te3)Antimony Tritelluride(Sb7Te3)
Antimonide Sputtering Targets
Aluminum Antimonide(AlSb)Indium Antimonide(InSb)Gallium Antimonide(GaSb)Zinc Antimonide(ZnSb)Aluminum Gallium Antimonide(AlGaSb)
Compound Sputtering Targets For Ferroelectric/Lithium Batteries
Lithium Cobalt Oxide LiCoO2Lithium Manganese Nickel Oxide LiNi0.5Mn1.5O3Lithium Iron Phosphate LiFePO4Lithium-Rich Lithium Cobalt OxideLi(1+X)CoO2Lithium-Rich Lithium ManganateLi(1+X)Mn2O4
Lithium TitanateLi4Ti5O12Aluminum Doped Lithium Cobalt Oxide AlLiCoO2Aluminum Doped Lithium Manganate LiMn2O4+AlxLithium Titanium PhosphateLiTi2(PO4)3Lithium Manganate LiMn2O4
Lithium Phosphate Li3PO4Lithium Silicon Phosphate LiSiPO4Barium TitanateBaTiO3Strontium TitanateSrTiO3Bismuth TitanateBiTiO3
Lanthanum Strontium Cobalt Oxide LSCOLanthanum Calcium Manganese Oxide LCMOLithium Cobalt Oxide LiCo2O4Lead Zirconate TitanatePZTBoron Oxide Doped Lithium Phosphate Li3PO4:B2O3
Lithium Lanthanum Titanate Li0.35La0.57TiO3Lanthanum Zirconium Lithium Oxide LLZOLanthanum Strontium Manganese OxideLSMOBismuth FerriteBiFeO3Barium Strontium Titanate BaSrTiO3



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