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Ceramic Sputtering Targets

Aluminum Nitride (AlN) Sputtering Targets


High purity 2N5 (99.5%) aluminum nitride ceramic target, The price is for reference only, please contact customer service for quotation.

Element:AlN
Purity:2N5--4N
Shape:Planar target
MOQ:1PC
Package:Three-layer vacuum packaging or argon gas protection, in line with IATA, DOT packaging specification

Overview

Physical and chemical properties

The aluminum nitride ceramic target is a ceramic sputtering material with a chemical formula of AlN, its melting point is 2200°C, its density is 3.26g/cm³, and its boiling point is 2,517°C. It has the characteristics of high hardness, high melting point, stable chemical properties and good electrical conductivity.

Manufacturing Method: Plasma Arc Vapor

Application

Mainly used for the preparation of integrated circuit subtraction, electronic devices, optical devices, thermal emission devices, high temperature crucibles, metal matrix and polymer matrix composite materials, especially for high temperature sealing adhesives and electronic packaging materials, Nano-AlN will be obtained in the future. Lots of applications.

Related Ceramic Sputtering Materials

Oxide Sputtering Targets
Aluminum Oxide(Al2O3)Iron Tetroxide(Fe3O4)Lanthanum Nickelate(LaNiO3)Scandium Oxide(Sc2O3)Aluminum Zinc Oxide(AZO)
Fluorine Tin Oxide(FTO)Lanthanum Ferrite(LaFeO3)Strontium Titanate(SrTiO3)Antimony Tin Oxide(ATO)Gallium Oxide(Ga2O3)
Lanthanum Manganate(LaMnO3)Strontium Ruthenate(SrRuO3)Bismuth Oxide(Bi2O3)Gallium Zinc Oxide(GZO)Magnesium Oxide(MgO)
Strontium Manganate(SrMnO3)Bismuth Titanate(BiTiO3)Gadolinium Oxide(Gd2O3)Molybdenum Oxide(MoO3)Titanium Dioxide(TiO2)
Barium Titanate(BaTiO3)Hafnium Dioxide(HfO2)Niobium Oxide(Nb2Ox)Titanium Pentoxide(Ti3O5)Cerium Oxide(CeO2)
Holmium Oxide(Ho2O3)Nickel Oxide(NiO)Tantalum Oxide(Ta2O5)Chromium Oxide(Cr2O3)Indium Oxide(In2O3)
Neodymium Oxide(Nd2O3)Terbium Oxide(Tb4O7)Cobalt Oxide(CoO)Indium Tin Oxide(ITO)Lead Oxide(PbO)
Thulium Oxide(Tm2O3)Copper Oxide(CuO)Indium Zinc Oxide(IZO)Zinc Tin Oxide(ZTO)Vanadium Dioxide(VO2)
Cuprous Oxide(Cu2O)Indium Gallium Zinc Oxide(IGZO)Praseodymium Oxide(Pr6O11)Vanadium Trioxide(V2O3)Erbium Oxide(Er2O3)
Lanthanum Oxide(La2O3)Silicon Monoxide(SiO)Vanadium Pentoxide(V2O5)Europium Oxide(Eu2O3)Lanthanum Strontium Cobalt Oxide(LSCO)
Silicon Dioxide(SiO2)Tungsten Trioxide(WO3)Iron Trioxide(Fe2O3)Lanthanum Aluminate(LaAl2O3)Samarium Oxide(Sm2O3)
Yttrium Oxide(Y2O3)Yttrium Zirconium Oxide(YSZ)Yttrium Barium Copper Oxide(YBCO)Zinc Oxide(ZnO)Zirconium Oxide(ZrO2)
Fluoride Sputtering Targets
Aluminum Fluoride(AlF3)Dysprosium Fluoride(DyF3)Neodymium Fluoride(NdF3)Praseodymium Fluoride(PrF3)Yttrium Fluoride(YF3)
Barium Fluoride(BaF2)Lithium Fluoride(LiF)Sodium Fluoride(NaF)Strontium Fluoride(SrF3)Zinc Fluoride(ZnF3)
Calcium Fluoride(CaF2)Lanthanum Fluoride(LaF3)Sodium Aluminum Fluoride(Na2AlF6)Samarium Fluoride(SmF3)Ytterbium Fluoride(YbF3)
Cerium Fluoride(CeF3)Magnesium Fluoride(MgF2)Potassium Fluoride(KF)
Nitride Sputtering Targets
Aluminum Nitride(AlN)Hafnium Nitride(HfN)Silicon Nitride(Si3N4)Titanium Nitride(TiN)Zirconium Nitride(ZrN)
Boron Nitride(BN)Niobium Nitride(NbN)Tantalum Nitride(TaN)Vanadium Nitride(VN)
Carbide Sputtering Targets
Boron Carbide(B4C)Niobium Carbide(NbC)Tantalum Carbide(TaC)Tungsten Carbide(WC)Zirconium Carbide(ZrC)
Hafnium Carbide(HfC)Nickel Carbide(NiC)Titanium Carbide(TiC)Tungsten Carbide Cobalt(WC+Co)Vanadium Carbide(VC)
Molybdenum Carbide(MoC)Silicon Carbide(SiC)Titanium Carbonitride(TiCN)
Boride Sputtering Targets
Chromium Diboride(CrB2)Iron Boride(FeB)Tantalum Boride(TaB)Titanium Diboride(TiB2)Hafnium Diboride(HfB2)
Lanthanum Hexaboride(LaB6)Zirconium Diboride(ZrB2)
Sulfide Sputtering Targets
Cadmium Sulfide(CdS)Iron Sulfide(FeS)Manganese Sulfide(MnS)Tantalum Sulfide(TaS)Magnesium Sulfide(MgS)
Copper Sulfide(CuS)Lead Sulfide(PbS)Niobium Sulfide(NbS)Tungsten Sulfide(WS2)Antimony Sulfide(Sb2S3)
Cerium Sulfide(Ce2S3)Molybdenum Sulfide(MoS2)Indium Sulfide(In2S3)Zinc Sulfide(ZnS)
Silicide Sputtering Targets
Chromium Silicide(CrSi)Magnesium Silicide(MgSi)Tantalum Silicide(TaSi2)Tungsten Silicide(WSi2)Zirconium Silicide(ZrSi2)
Molybdenum Silicide(MoSi2)Nickel Silicide(NiSi)Titanium Silicide(TiSi2)Vanadium Silicide(VSi)
Selenide Sputtering Targets
Bismuth Selenide(Bi2Se3)Chromium Selenide(CrSe)Molybdenum Selenide(MoSe2)Gallium Selenide(Ga2Se3)Tungsten Selenide(WSe2)
Copper Selenide(Cu2Se)Lead Selenide(PbSe)Indium Selenide(In2Se3)Germanium Selenide(GeSe2)Tin Selenide(SnSe)
Cadmium Selenide(CdSe)Antimony Selenide(Sb2Se3)
Telluride Sputtering Targets
Cadmium Telluride(CdTe)Lead Telluride(PbTe)Germanium Telluride(GeTe)Germanium Antimony Telluride(GST)Bismuth Telluride(Bi2Te3)
Antimony Tritelluride(Sb2Te3)Antimony Tritelluride(Sb7Te3)
Antimonide Sputtering Targets
Aluminum Antimonide(AlSb)Indium Antimonide(InSb)Gallium Antimonide(GaSb)Zinc Antimonide(ZnSb)Aluminum Gallium Antimonide(AlGaSb)
Compound Sputtering Targets For Ferroelectric/Lithium Batteries
Lithium Cobalt Oxide LiCoO2Lithium Manganese Nickel Oxide LiNi0.5Mn1.5O3Lithium Iron Phosphate LiFePO4Lithium-Rich Lithium Cobalt OxideLi(1+X)CoO2Lithium-Rich Lithium ManganateLi(1+X)Mn2O4
Lithium TitanateLi4Ti5O12Aluminum Doped Lithium Cobalt Oxide AlLiCoO2Aluminum Doped Lithium Manganate LiMn2O4+AlxLithium Titanium PhosphateLiTi2(PO4)3Lithium Manganate LiMn2O4
Lithium Phosphate Li3PO4Lithium Silicon Phosphate LiSiPO4Barium TitanateBaTiO3Strontium TitanateSrTiO3Bismuth TitanateBiTiO3
Lanthanum Strontium Cobalt Oxide LSCOLanthanum Calcium Manganese Oxide LCMOLithium Cobalt Oxide LiCo2O4Lead Zirconate TitanatePZTBoron Oxide Doped Lithium Phosphate Li3PO4:B2O3
Lithium Lanthanum Titanate Li0.35La0.57TiO3Lanthanum Zirconium Lithium Oxide LLZOLanthanum Strontium Manganese OxideLSMOBismuth FerriteBiFeO3Barium Strontium Titanate BaSrTiO3



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