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Alloy Sputtering Targets

Tungsten Titanium (WTi) Sputtering Targets


High purity 4N (99.99%) tungsten titanium alloy target, The price is for reference only, please contact customer service for quotation.

Element:WTi
Purity:3N5 4N 4N5
Shape:Planar target
MOQ :1PC
Package:Three-layer vacuum packaging or argon gas protection, in line with IATA, DOT packaging specification

Overview

Physical and chemical properties

Tungsten-titanium alloy targets are produced by powder metallurgy technology and are widely used in semiconductors and thin-film solar cells.

The WTi 10 wt% film is used as a diffusion barrier and adhesion layer to separate metallization layers from semiconductors, eg, aluminum from silicon, or copper from silicon. Thus, the functionality of semiconductors in microchips can be significantly improved. For thin-film solar cells, the WTi 10 wt% film also acts as a barrier to prevent iron atoms in the steel substrate from diffusing to the molybdenum back contact and the CIGS semiconductor. Tungsten-titanium alloy targets are also used in LED and tool coatings.

Our factory can produce WTi 90/10wt%, WTi 85/15wt% targets, and can customize special composition targets, the actual target density is > 99%, and the average grain size is < 100um. With up to 4N5 purity and special annealing treatment, uniform grain size, and low gas content, end users can obtain constant corrosion rates and high purity and uniform thin film coatings during the PVD process.

WTi90/10wt%-4N-COA

Alloy Sputtering Targets
Nickel vanadium target(NiV target)3N5Iron manganese target(FeMn target)3N5
Nickel chromium target(NiCr target)2N8,3N,3N5Aluminum copper target(AlCu target)4N,4N5,5N
Nickel iron target(NiFe target)3N5Aluminum silicon target(AlSi target)4N,4N5,5N
Nickel platinum target(NiPt target)3N5Aluminum titanium target(AlTi target)4N,4N5
Nickel copper target(NiCu target)3N5Aluminum tin copper target(AlSnCu target)4N
Nickel copper titanium target(NiCuTi target)3N5Aluminum copper silicon target(AlCuSi target)4N
Nickel copper manganese target(NiCuMn target)3N5Aluminum chromium target(AlCr target)4N
Aluminum titanium target(NiTi target)3N5,4NAluminum neodymium target(AlNd target)4N
Nickel tungsten target(NiW target)4NAluminum scandium target(AlSc target)3N5
Nickel cobalt target(NiCo target)3N5Aluminum zinc target(AlZn target)3N5,4N
Nickel chromium silicon target(NiCrSi target)3NAluminum magnesium target(AlMg target)3N5,4N
Nickel chromium iron target(NiCrFe target)3NVanadium titanium target(VTi target)3N5
Nickel iron molybdenum target(NiFeMo target)3NVanadium tantalum tungsten target(VTaW target)3N5
Cobalt-tantalum-zirconium target(CoTaZr target)3N5Tungsten-titanium target(WTi target)3N5,4N
Cobalt chromium target(CoCr target)3N5Tungsten molybdenum target(WMo target)3N5
Cobalt chromium molybdenum target(CoCrMo target)3N5Molybdenum niobium target(MoNb target)3N5
Cobalt chromium tungsten target(CoCrW target)3N5Molybdenum tantalum target(MoTa target)3N5
Cobalt chromium nickel target(CoCrNi target)3N5Molybdenum sodium target(MoNa target)3N5
Copper-nickel target(CuNi target)3N5Niobium-tin target(NbSn target)3N5
Copper nickel titanium target(CuNiTi target)3N5Niobium zirconium target(NbZr target)3N5
Copper gallium target(CuGa target)4N,4N5Tantalum tungsten target(TaW target)3N5
Copper indium target(CuIn target)4N,4N5Tantalum niobium target(TaNb target)3N5
Copper indium gallium target(CuInGa target)4N,4N5Chromium aluminum target(CrAl target)3N
Copper aluminum target(CuAl target)4N,4N5,5NChromium silicon target(CrSi target)3N
Copper tin target(CuSn target)4NChromium silicon aluminum target(CrSiAl target)3N
Iron hafnium target(FeHf target)3N5Zinc tin target(ZnSn target)4N
Iron-nickel target(FeNi target)3N5,4NZinc-aluminum target(ZnAl target)4N
Iron-silicon target(FeSi target)3N5Tin-silver-copper target(SnAgCu target)4N
Iron-cobalt target(FeCo target)3N5Indium-tin target(InSn target)4N


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