Aluminum Titanium (AlTi) Sputtering Targets
High purity 3N (99.9%) Aluminum Titanium alloy target, The price is for reference only, please contact customer service for quotation.
Element: | AlTi |
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Purity: | 2N8 3N |
Shape: | Planar target |
MOQ: | 1PC |
Package: | Three-layer vacuum packaging or argon gas protection, in line with IATA, DOT packaging specification |
Overview
Physical and chemical properties
The titanium-aluminum alloy target is produced by hot isostatic pressing technology, with good hardness, high brightness, corrosion resistance and oxidation resistance, and does not change color for a long time. Widely used in tool coating, decorative coating, various magnetron sputtering machines and ion plating machines. The end result is a constant erosion rate as well as a high purity and uniform thin film coating during the PVD process.
Tools with titanium-coated aluminum film have higher feed rates, better cutting performance, longer service life and higher metal removal rates that can be achieved effortlessly. Titanium-aluminum sputtering targets and arc cathodes are also used for decorative coatings to obtain gold-brown and brown-black films. Our targets have been approved by numerous end-users, including manufacturers of watches, bathrooms, car mirrors, and more.
Xinkang manufactures AlTi 25/75, AlTi 30/70, AlTi 33/67, AlTi 40/60, AlTi 50/50, AlTi 75/25 at% targets and cathodes for decorative and tool coating. The flexibility of our production process allows us to adjust the microstructure of the coating material to achieve the effect you desire. If the particles of the sputtering target are uniformly arranged, the user can benefit from a constant etch rate and a uniform layer.
Below are two photomicrographs of our Al-Ti (30/70 at%) sputtering targets with an average grain size <100μm.
We produce titanium-aluminum alloy sputtering targets with high purity and the most important advantage is that your films have excellent electrical conductivity and minimize particle formation during the PVD process. The table below is a typical analytical demonstration of a 2N8 high-purity titanium-aluminum (30/70 atomic %) sputtering target.
AlTi-3N-COA
Alloy Sputtering Targets | |||
Nickel vanadium target(NiV target) | 3N5 | Iron manganese target(FeMn target) | 3N5 |
Nickel chromium target(NiCr target) | 2N8,3N,3N5 | Aluminum copper target(AlCu target) | 4N,4N5,5N |
Nickel iron target(NiFe target) | 3N5 | Aluminum silicon target(AlSi target) | 4N,4N5,5N |
Nickel platinum target(NiPt target) | 3N5 | Aluminum titanium target(AlTi target) | 4N,4N5 |
Nickel copper target(NiCu target) | 3N5 | Aluminum tin copper target(AlSnCu target) | 4N |
Nickel copper titanium target(NiCuTi target) | 3N5 | Aluminum copper silicon target(AlCuSi target) | 4N |
Nickel copper manganese target(NiCuMn target) | 3N5 | Aluminum chromium target(AlCr target) | 4N |
Aluminum titanium target(NiTi target) | 3N5,4N | Aluminum neodymium target(AlNd target) | 4N |
Nickel tungsten target(NiW target) | 4N | Aluminum scandium target(AlSc target) | 3N5 |
Nickel cobalt target(NiCo target) | 3N5 | Aluminum zinc target(AlZn target) | 3N5,4N |
Nickel chromium silicon target(NiCrSi target) | 3N | Aluminum magnesium target(AlMg target) | 3N5,4N |
Nickel chromium iron target(NiCrFe target) | 3N | Vanadium titanium target(VTi target) | 3N5 |
Nickel iron molybdenum target(NiFeMo target) | 3N | Vanadium tantalum tungsten target(VTaW target) | 3N5 |
Cobalt-tantalum-zirconium target(CoTaZr target) | 3N5 | Tungsten-titanium target(WTi target) | 3N5,4N |
Cobalt chromium target(CoCr target) | 3N5 | Tungsten molybdenum target(WMo target) | 3N5 |
Cobalt chromium molybdenum target(CoCrMo target) | 3N5 | Molybdenum niobium target(MoNb target) | 3N5 |
Cobalt chromium tungsten target(CoCrW target) | 3N5 | Molybdenum tantalum target(MoTa target) | 3N5 |
Cobalt chromium nickel target(CoCrNi target) | 3N5 | Molybdenum sodium target(MoNa target) | 3N5 |
Copper-nickel target(CuNi target) | 3N5 | Niobium-tin target(NbSn target) | 3N5 |
Copper nickel titanium target(CuNiTi target) | 3N5 | Niobium zirconium target(NbZr target) | 3N5 |
Copper gallium target(CuGa target) | 4N,4N5 | Tantalum tungsten target(TaW target) | 3N5 |
Copper indium target(CuIn target) | 4N,4N5 | Tantalum niobium target(TaNb target) | 3N5 |
Copper indium gallium target(CuInGa target) | 4N,4N5 | Chromium aluminum target(CrAl target) | 3N |
Copper aluminum target(CuAl target) | 4N,4N5,5N | Chromium silicon target(CrSi target) | 3N |
Copper tin target(CuSn target) | 4N | Chromium silicon aluminum target(CrSiAl target) | 3N |
Iron hafnium target(FeHf target) | 3N5 | Zinc tin target(ZnSn target) | 4N |
Iron-nickel target(FeNi target) | 3N5,4N | Zinc-aluminum target(ZnAl target) | 4N |
Iron-silicon target(FeSi target) | 3N5 | Tin-silver-copper target(SnAgCu target) | 4N |
Iron-cobalt target(FeCo target) | 3N5 | Indium-tin target(InSn target) | 4N |